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侧壁粗糙度与几何结构对SOI脊形波导损耗的影响

Effects of Sidewall-Roughness and Geometry on Scattering Loss of SOI Rib Waveguide

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【作者】 刘军刘金良陈亮张忠兵刘林月

【Author】 LIU Jun;LIU Jin-liang;CHEN Liang;ZHANG Zhong-bing;LIU Lin-yue;Northwest Institute of Nuclear Technology;College of Mechatronics Engineering and Automation,National University of Defense Technology;

【机构】 西北核技术研究所国防科技大学机电工程与自动化学院

【摘要】 基于条形波导传统数学模型和等效折射率方法,建立了SOI(silicon-on-insulator)脊形波导散射损耗的数学模型,重点讨论了侧壁粗糙度与几何结构对波导散射损耗系数的影响。研究表明:侧壁粗糙度是引起散射损耗的主要因素;波导几何结构对散射损耗的影响主要由波导宽度决定;对于给定刻蚀深度,损耗随波导宽度增大而减小;对于给定波导宽度,损耗随刻蚀深度增大而增大。

【Abstract】 A numerical model was developed based on conventional expressions of strip waveguide and the equivalent index method to investigate the effects of sidewall roughness and geometry of SOI rib waveguides on the scattering loss.The calculation result shows the sidewall roughness is the chief factor for causing scattering loss,and the loss caused by geometry is determined by the width of the waveguide.For a given etching depth,the loss would decrease with the increase of width,and for a given width of waveguide,it would rise with the increase of etching depth.

  • 【文献出处】 现代应用物理 ,Modern Applied Physics , 编辑部邮箱 ,2015年01期
  • 【分类号】TN814
  • 【被引频次】1
  • 【下载频次】157
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