节点文献

硅基Ⅲ-Ⅴ族量子点激光器的发展现状和前景

Quantum dot lasers on silicon substrate for silicon photonic integration and their prospect

  • 推荐 CAJ下载
  • PDF下载
  • 不支持迅雷等下载工具,请取消加速工具后下载。

【作者】 王霆张建军Huiyun Liu

【Author】 Wang Ting;Zhang Jian-Jun;Huiyun Liu;Institute of Physics,Chinese Academy Sciences;Department of Electrical and Electronic Engineering,University College London;

【机构】 中国科学院物理研究所Department of Electrical and Electronic Engineering,University College London

【摘要】 本文简要综述了硅基Ⅲ-Ⅴ族量子点激光器的研究进展.在介绍了量子点激光器的优势和发展后,重点介绍了近年来硅基、锗基Ⅲ-Ⅴ族量子点材料生长上的突破性进展及所带来的器件性能的大幅提高,如实现了锗基和硅基1.3μm InAs/GaAs量子点激光器的室温激射,锗基量子点激光器的阈值电流低至55.2 A/cm~2并可达60℃以上的连续激射,通过锗硅虚拟衬底,在硅基上实现了30℃下以16.6 mW的输出功率达到4600 h的激光寿命,这些突破性的进展为硅基光电子集成打开了新的大门.

【Abstract】 In this article,the recent progress of Ⅲ-Ⅴ quantum dot lasers on silicon substrates for silicon photonic integration is reviewed.By introducing various epitaxial techniques,room-temperature 1.3-μm InAs/GaAs quantum dot laser on Si,Ge and SiGe substrates have been achieved respectively.Quantum dot lasers on Ge substrate has an ultra-low threshold current density of 55.2 A/cm~2 at room temperature,which can operate over 60℃ in continuous-wave mode.Puthermore,by using the SiGe virtual substrate,at 30 ℃ and an output power of 16.6 mW,a laser lifetime of 4600 h has been reached,which indicates a bright future for the large-scale photonic integration.

  • 【文献出处】 物理学报 ,Acta Physica Sinica , 编辑部邮箱 ,2015年20期
  • 【分类号】TN248
  • 【被引频次】14
  • 【下载频次】958
节点文献中: 

本文链接的文献网络图示:

本文的引文网络