Fabrication of Through Micro-hole Arrays in Silicon Using Femtosecond Laser Irradiation and Selective Chemical Etching

【摘要】 We demonstrate a method of fabricating through micro-holes and micro-hole arrays in silicon using femtosecond laser irradiation and selective chemical etching.The micro-hole formation mechanism is identified as the chemical reaction of the femtosecond laser-induced structure change zone and hydrofluoric acid solution.The morphologies of the through micro-holes and micro-hole arrays are characterized by using scanning electronic microscopy.The effects of the pulse number on the depth and diameter of the holes are investigated.Honeycomb arrays of through micro-holes fabricated at different laser powers and pulse numbers are demonstrated.更多还原

【Abstract】 We demonstrate a method of fabricating through micro-holes and micro-hole arrays in silicon using femtosecond laser irradiation and selective chemical etching.The micro-hole formation mechanism is identified as the chemical reaction of the femtosecond laser-induced structure change zone and hydrofluoric acid solution.The morphologies of the through micro-holes and micro-hole arrays are characterized by using scanning electronic microscopy.The effects of the pulse number on the depth and diameter of the holes are investigated.Honeycomb arrays of through micro-holes fabricated at different laser powers and pulse numbers are demonstrated.更多还原