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Tuning the Electronic Structure of Sr2IrO4 Thin Films by Bulk Electronic Doping Using Molecular Beam Epitaxy

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【作者】 李明颖刘正太杨海峰赵家琳姚岐樊聪聪刘吉山高波沈大伟谢晓明

【Author】 LI Ming-Ying;LIU Zheng-Tai;YANG Hai-Feng;ZHAO Jia-Lin;YAO Qi;FAN Cong-Cong;LIU Ji-Shan;GAO Bo;SHEN Da-Wei;XIE Xiao-Ming;State Key Laboratory of Functional Materials for Informatics,Shanghai Institute of Microsystem and Information Technology(SIMIT),Chinese Academy of Sciences;State Key Laboratory of Surface Physics,Department of Physics,and Advanced Materials Laboratory,Fudan University;

【机构】 State Key Laboratory of Functional Materials for Informatics,Shanghai Institute of Microsystem and Information Technology(SIMIT),Chinese Academy of SciencesState Key Laboratory of Surface Physics,Department of Physics,and Advanced Materials Laboratory,Fudan University

【摘要】 By means of oxide molecular beam epitaxy with shutter-growth mode,we fabricate a series of electron-doped(Sr1-xLax)2IrO4,(001)(x=0,0.05,0.1 and 0.15) single crystalline thin films and then investigate the doping dependence of the electronic structure utilizing in-situ angle-resolved photoemission spectroscopy.It is found that with the increasing doping content,the Fermi levels of samples progressively shift upward.Prominently,an extra electron pocket crossing the Fermi level around the M point is evidently observed in the 15%nominal doping sample.Moreover,bulk-sensitive transport measurements confirm that the doping effectively suppresses the insulating state with respect to the as-grown Sr2IrO4,though the doped samples still remain insulating at low temperatures due to the localization effect possibly stemming from disorders including oxygen deficiencies.Our work provides another feasible doping method to tune electronic structure of Sr2IrO4.

【Abstract】 By means of oxide molecular beam epitaxy with shutter-growth mode,we fabricate a series of electron-doped(Sr1-xLax)2IrO4,(001)(x=0,0.05,0.1 and 0.15) single crystalline thin films and then investigate the doping dependence of the electronic structure utilizing in-situ angle-resolved photoemission spectroscopy.It is found that with the increasing doping content,the Fermi levels of samples progressively shift upward.Prominently,an extra electron pocket crossing the Fermi level around the M point is evidently observed in the 15%nominal doping sample.Moreover,bulk-sensitive transport measurements confirm that the doping effectively suppresses the insulating state with respect to the as-grown Sr2IrO4,though the doped samples still remain insulating at low temperatures due to the localization effect possibly stemming from disorders including oxygen deficiencies.Our work provides another feasible doping method to tune electronic structure of Sr2IrO4.

【基金】 Supported by the National Basic Research Program of China(973 Program)under Grant Nos 2011CBA00106 and2012CB927400;the National Natural Science Foundation of China under Grant Nos 11274332 and 11227902;Helmholtz Association through the Virtual Institute for Topological Insulators(VITI).M.Y.Li and D.W.Shen are also supported by the Strategic Priority Research Program(B)of the Chinese Academy of Sciences under Grant No XDB04040300
  • 【文献出处】 Chinese Physics Letters ,中国物理快报(英文版) , 编辑部邮箱 ,2015年05期
  • 【分类号】O484
  • 【下载频次】15
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