【摘要】 采用SX-4-13箱式回火电阻炉,在氮气保护条件下对电弧离子镀技术沉积的TiAlN膜层进行回火热处理。研究回火温度对TiAlN膜层表面形貌、粗糙度、显微硬度、耐磨性的影响。结果表明:回火温度为300℃时膜层表面形貌连续、光滑、粗糙度最低,粗糙度值为0.30。力学试验结果表明:回火温度为300℃时膜层的表面显微硬度最高,由未回火热处理前的1800HV0.01升高到2000HV0.01,此温度下膜层的耐磨性最好,回火温度过高或者过低都会降低膜层的表面质量。更多还原

【Abstract】 TiAlN films fabricated by arc ion plating were tempered by SX-4-13 chamber electric furnace under the condition of nitrogen. The effect of tempering temperature on surface morphology,roughness,micro-hardness of Ti Al N films is studied. The results showthat the surface morphology is flat and smooth with the lowest roughness value of 0. 30 as the tempering temperature is 300℃. The results of mechanics experiments exhibited that the micro- hardness value is highest when the tempering temperature is 300℃,as the value is increased from 1800HV0. 01 before tempering treatment to 2000HV0. 01. However,the surface quality of TiAlN films will get worse at higher or lower tempering temperature.更多还原