【摘要】 用电阻热蒸法在玻璃基底上沉积铜薄膜,然后在空气中退火得到铜氧化物薄膜。分别用XRD、AFM、紫外-可见分光光度计对薄膜进行表征,研究退火温度及退火时间对铜氧化物薄膜结构和光学性能的影响。结果表明140~180℃退火时可以得到纯的Cu2O,薄膜表面颗粒大小在0.80~0.90μm之间,直接禁带宽度在1.8~2.5e V之间。更多还原

【Abstract】 Copper oxide thin films were synthesized on glass substrates by thermal oxidization of Cu films which were prepared using a thermal evaporation method.XRD,AFM and UV-vis-NIR absorption spectra were used to characterize the thin films in order to study thedependence of the structure,morphology and optical properties of the thin films on annealing temperatures andduration time.Our experimental results show that pure Cu2O can be obtained at 140 ~ 180℃ with the size ranging from 0.80 to 0.90μm.Theirdirect allowed band gap is of 1.8 ~ 2.5eV.更多还原