X-ray nanometer focusing at the SSRF based on a multilayer Laue lens

【摘要】 We designed and fabricated a multilayer Laue lens（MLL） as a hard X-ray focusing device.WSi₂/Si multilayers were chosen owing to their excellent optical properties and relatively sharp interface.The multilayer sample was fabricated by using direct current（DC） magnetron sputtering technology and then was sliced and thinned to form an MLL.The thickness of each layer was determined by scanning electron microscopy（SEM） image analysis with marking layers.The focusing property of the MLL was measured at Beamline 15 U,Shanghai Synchrotron Facility（SSRF）.One-dimensional（1D） focusing resolutions of 92 nm are obtained at photon energy of 14 keV.更多还原

【Abstract】 We designed and fabricated a multilayer Laue lens（MLL） as a hard X-ray focusing device.WSi₂/Si multilayers were chosen owing to their excellent optical properties and relatively sharp interface.The multilayer sample was fabricated by using direct current（DC） magnetron sputtering technology and then was sliced and thinned to form an MLL.The thickness of each layer was determined by scanning electron microscopy（SEM） image analysis with marking layers.The focusing property of the MLL was measured at Beamline 15 U,Shanghai Synchrotron Facility（SSRF）.One-dimensional（1D） focusing resolutions of 92 nm are obtained at photon energy of 14 keV.更多还原