【摘要】 发射光谱研究是热喷涂等离子体诊断的一种重要的方法。通过使用发射光谱测量氩原子在763.51 nm和772.42 nm处谱线辐射强度的信息,采用双谱线法计算低压热喷涂等离子体射流的电子温度,研究氩气流量40 L/min、氢气流量15 L/min,不同的弧电流和不同的探测距离条件下,低压热喷涂等离子体射流中电子温度的变化情况。通过使用Hβ谱线的Stark展宽计算热喷涂等离子体射流的电子密度,研究不同探测距离对电子密度的影响。结果表明,电子温度随等离子体功率的增加而增加,同时也发现随着距喷枪出口轴向探测距离的增加(150~450 mm),电子温度逐渐减小;当探测距离从100 mm增加时等离子体的电子密度显著下降,随后,电子密度变化不大。更多还原

【Abstract】 Emission spectroscopy is an important method for plasma diagnostics. The intensity ratio of spectrum lines at 763.51 nm and 772.42 nm is used to estimate the electron excited temperature of the thermal plasma jet under the low pressure plasma spray. Impact of different power levels and detection distance on the electron temperature in the thermal spray plasma jet under Ar/H2 flow rate of 40 L/min/15 L/min is investigated. Electron number density of the plasma jet is determined using stark broadening of Hβ, impact of changes of the detection distance is also studied. An increase in input power considerably increases the electron temperature, while it is found that electron temperature decreases with detection distance from nozzle exit increasing from 150 mm to 450 mm, and the increase of detection distance from l00 mm can remarkably reduce the electron number density. After that, there is little change of electron number density.更多还原