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微晶玻璃超光滑抛光过程中抛光剂选型实验研究

Experimental Study on the Selection of Polishing Powder During Super-Smooth Polishing Progress of Glass-Ceramic

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【作者】 袁顺山程子清陈光

【Author】 YUAN Shun-shan;CHENG Zi-qing;CHEN Guang;Huazhong Institute of Electro-Optics—Wuhan National Laboratory for Optoelectronics;

【机构】 华中光电技术研究所—武汉光电国家实验室

【摘要】 从传统光学冷加工的原理出发,分析了传统接触式加工方法中抛光剂与材料去除深度的理论关系,设计了微晶玻璃超光滑抛光过程中的抛光剂选型试验。通过比较基片的表面质量,摸索出适合微晶玻璃超光滑抛光的最佳抛光剂为金刚石微粉,成功加工出了超光滑微晶光学元件,其表面粗糙度达到0.2nm。

【Abstract】 By studying on the principle of the traditional optical cold processing,the theoretical relationship between polishing power and the removed depth of material is analyzed.An experiment about ultra-smooth polishing of glass ceramic is designed.By comparing the results of substrate surface quality,the optimal processing parameters of ultra-smooth glass-ceramic processing are worked out.The ultra-smooth optical components are successfully fabricated,whose surface roughness could be reach at 0.2nm.

  • 【文献出处】 光学与光电技术 ,Optics & Optoelectronic Technology , 编辑部邮箱 ,2015年04期
  • 【分类号】TQ171.733
  • 【被引频次】2
  • 【下载频次】228
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