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光刻投影物镜中X-Y向柔性调节机构设计
Designing for Flexure-based X-Y Adjusting Mechanism of Lithograph Projection Objective
【摘要】 X-Y向柔性调节机构应用于光刻投影物镜中光学元件X-Y方向偏心位置补偿。基于柔性铰链,设计柔性二级减速机构,并将之应用到新型的一体式X-Y向柔性调节机构上。在对机构原理进行分析的基础上,对X-Y向柔性调节机构结构参数进行了优化设计。进一步,运用有限元分析法,分析了该X-Y向柔性调节机构的性能。分析结果表明,该机构调节行程大于±20μm,机构位移输入?输出关系稳定,传动比约11.9,理论调节精度约8.4 nm,机构单方向驱动刚度为0.473μm/N;机构开环单轴运动时,耦合误差与主运动比值为7.1%;机构1阶模态频率大于200 Hz。该X-Y向柔性调节机构能够应用到光刻投影物镜中。
【Abstract】 The flexure-based X-Y adjusting mechanism is applied in lithograph projection objectives to compensate the eccentric position of the optical elements in X-Y direction. Based on flexible hinges, two-stage flexible deceleration mechanism is designed. Further, making use of the two-stage flexible deceleration mechanism, a flexure-based X-Y adjusting mechanism which is new and of one part is created. Based on the analysis of the principle of the mechanism, structural parameters of the flexure-based X-Y adjusting mechanism are optimized. Moreover, using finite element method, performance of the flexure-based X-Y adjusting mechanism is studied. The results showed that the adjusting stroke is greater than ±20 μm, the displacement input-output relationship of the mechanism is steady, the transmission ratio is 11.9, the theoretically regulation accuracy is about 8.4 nm, the single-direction drive stiffness is 0.473 μm/N, and the ratio of coupling error and the main movement is 7.1%, when the mechanism moves open-loop and single-axis, and the first modal frequency is greater than 200 Hz. The flexure-based X-Y adjusting mechanism can be used in lithograph projection objective.
【Key words】 lithograph projection objective; flexure-based X-Y adjusting mechanism; deceleration mechanism; flexible hinge;
- 【文献出处】 光电工程 ,Opto-Electronic Engineering , 编辑部邮箱 ,2015年06期
- 【分类号】TH74
- 【被引频次】3
- 【下载频次】154