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磷硅镉的差热分析与晶体生长(英文)
Differential Thermal Analysis and Crystal Growth of CdSiP2
【摘要】 利用毛细管中的差热分析研究了磷硅镉晶体的热力学性质,得到了磷硅镉的熔点和凝固点分别为1139和1126℃,过冷度为13℃。根据差热分析结果,对晶体生长炉以及温场分布进行了优化,采用改进的布里奇曼法生长得到了直径15 mm,长40 mm的无开裂磷硅镉晶体。利用X射线衍射,能谱以及红外分光光度计对晶体进行了表征。发现了(112)解理面,能谱测试表明晶体符合化学计量配比,在70001500 cm-1红外透光范围内红外透过率达到55%。所有表征手段显示得到的晶体结构完整,光学性能良好,可用于器件的制作。
【Abstract】 Thermal properties of CdSiP2 polycrystalline were studied by differential thermal analysis(DTA) technique with a quartz capillary column.It is found that the melting point and crystallization temperature of CdSiP2 are 1139 and 1126 ℃,respectively,and the supercooling degree of CdSiP2 melt is evaluated to be 13 ℃.According to the results of DTA,the structure of a furnace and the temperature profile of the crystal growth for CdSiP2 were optimized.A crack-free CdSiP2 crystal with 15 mm in diameter and 40 mm in length was grown by the modified vertical Bridgman(VB) method.The X-ray diffractionmeter(XRD),X-ray energy dispersive microanalysis(EDX) and infrared spectrophotometer(IR) were employed to characterize the properties of as-grown crystal.A new cleavage face of(112) was identified in XRD spectrum.The results of EDX indicate that the crystal is of good stoichiometry.The infrared transmission is up to 55%in the infrared region from 7000 to 1500 cm-1.All the characterization results show that the obtained crystal is integrated in structure and good in optical quality which can be used in devices fabrication.
【Key words】 CdSiP2; crystal growth; characterizations; differential thermal analysis;
- 【文献出处】 稀有金属材料与工程 ,Rare Metal Materials and Engineering , 编辑部邮箱 ,2015年11期
- 【分类号】O78
- 【被引频次】4
- 【下载频次】126