节点文献

An improved performance of copper phthalocyanine OFETs with channel and source/drain contact modifications

  • 推荐 CAJ下载
  • PDF下载
  • 不支持迅雷等下载工具,请取消加速工具后下载。

【作者】 党焕芹吴晓明孙小卫邹润秋章若川印寿根

【Author】 Dang Huanqin;Wu Xiaoming;Sun Xiaowei;Zou Runqiu;Zhang Ruochuan;Yin Shougen;Institute of Material Physics,Tianjin University of Technology;Key Laboratory of Display Material and Photoelectric Devices,Ministry of Education of China,Tianjin University of Technology;School of Electrical & Electronic Engineering,Nanyang Technological University;

【机构】 Institute of Material Physics,Tianjin University of TechnologyKey Laboratory of Display Material and Photoelectric Devices,Ministry of Education of China,Tianjin University of TechnologySchool of Electrical & Electronic Engineering,Nanyang Technological University

【摘要】 We report an effective method to improve the performance of p-type copper phthalocyanine(Cu Pc)based organic field-effect transistors(OFETs) by employing a thin para-quaterphenyl(p-4p) film and simultaneously applying V2O5 to the source/drain regions.The p-4p layer was inserted between the insulating layer and the active layer,and V2O5 layer was added between Cu Pc and Al in the source–drain(S/D) area.As a result,the fieldeffect saturation mobility and on/off current ratio of the optimized device were improved to 5102cm2/(V s)and 104,respectively.We believe that because p-4p could induce Cu Pc to form a highly oriented and continuous film,this resulted in the better injection and transport of the carriers.Moreover,by introducing the V2O5 electrode’s modified layers,the height of the carrier injection barrier could be effectively tuned and the contact resistance could be reduced.

【Abstract】 We report an effective method to improve the performance of p-type copper phthalocyanine(Cu Pc)based organic field-effect transistors(OFETs) by employing a thin para-quaterphenyl(p-4p) film and simultaneously applying V2O5 to the source/drain regions.The p-4p layer was inserted between the insulating layer and the active layer,and V2O5 layer was added between Cu Pc and Al in the source–drain(S/D) area.As a result,the fieldeffect saturation mobility and on/off current ratio of the optimized device were improved to 5102cm2/(V s)and 104,respectively.We believe that because p-4p could induce Cu Pc to form a highly oriented and continuous film,this resulted in the better injection and transport of the carriers.Moreover,by introducing the V2O5 electrode’s modified layers,the height of the carrier injection barrier could be effectively tuned and the contact resistance could be reduced.

【基金】 Project supported by the National Natural Science Foundation of China(No.60676051);the National High Technology Research and Development Program of China(No.2013A A014201);the Scientific Developing Foundation of Tianjin Education Commission(No.2011ZD02);the Key Science and Technology Support Program of Tianjin(No.14ZCZDGX00006);the Foundation of Key Discipline of Material Physics and Chemistry of Tianjin
  • 【文献出处】 Journal of Semiconductors ,半导体学报(英文版) , 编辑部邮箱 ,2015年10期
  • 【分类号】TN386
  • 【被引频次】1
  • 【下载频次】26
节点文献中: 

本文链接的文献网络图示:

本文的引文网络