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银基透明导电薄膜制备及其性能研究
Preparation of Ag-based transparent conductive films and their characteristics
【摘要】 采用磁控溅射方法制备了ZnO/Ag/ZnO、AZO/Ag/AZO三层和AZO/LiF/Ag/LiF/AZO、AZO/Al/Ag/Al/AZO五层透明导电薄膜,该体系薄膜450~700 nm的平均透过率在80%以上,方块电阻约5Ω/sq。插入LiF和Al的AZO/LiF/Ag/LiF/AZO和AZO/Al/Ag/Al/AZO导电薄膜在723 K退火后方块电阻分别为5.7Ω/sq和7.6Ω/sq,而AZO/Ag/AZO薄膜电阻快速上升到27Ω/sq。这表明五层结构的透明导电薄膜相比三层结构的导电薄膜明显的提高了热稳定性。可能原因是插入的LiF或Al层能抑制Ag原子的扩散和团聚。
【Abstract】 The multilayer transparent conducting films of ZnO/Ag/ZnO,AZO/Ag/AZO and AZO/LiF/Ag/LiF/AZO,AZO/Al/Ag/Al/AZO were fabricated by magnetron sputtering,respectively. These conducting films have sheet resistance as low as 5 Ω/sq and average optical transmittance of more than 80% at 450~700 nm. The sheet resistance of AZO/LiF/Ag/LiF/AZO and AZO/Al/Ag/Al/AZO reached respectively 5.7 Ω/sq and 7.6 Ω/sq after annealing at 723 K for 10 min. However,the sheet resistance of AZO/Ag/AZO quickly reached 27 Ω/sq under the same annealing condition. Compared with three-layer films,five-layer films show better thermal stability because of limitation function of LiF and Al interlayer on Ag aggregation and diffusion.
【Key words】 transparent conducting film; magnetron sputtering; Ag films; thermal stability;
- 【文献出处】 真空 ,Vacuum , 编辑部邮箱 ,2014年05期
- 【分类号】TB383.2
- 【被引频次】2
- 【下载频次】198