节点文献
EACVD一体化系统衬底温度控制研究
Control of substrate temperature in the integration electron-assisted chemical vapor deposition system
【摘要】 以电子辅助热丝化学气相沉积(Electron-assisted Chemical Vapor Deposition,EACVD)一体化系统为研究对象,根据金刚石沉积过程中对衬底温度的要求,设计了模糊PID衬底温度控制系统。使用结果表明:该系统对化学气相沉积(CVD)金刚石的衬底温度参数控制精确,能够长时间稳定运行,可以制备出高质量的CVD金刚石涂层。
【Abstract】 According to the requirement for the temperature in the deposition of the diamond,a fuzzy-PID compound control method was established in the integration Electron-Assisted Chemical Vapor Deposition( EACVD) system. The experiment of CVD diamond deposition shows that the process parameters can be accurately controlled and the system can apply stable long-term operation. It can be used for the deposition of high quality CVD diamond coating.
【关键词】 电子辅助热丝化学气相沉积;
金刚石膜;
模糊-线性控制器;
衬底温度场;
【Key words】 EACVD; diamond film; fuzzy-PID; substrate temperature;
【Key words】 EACVD; diamond film; fuzzy-PID; substrate temperature;
- 【文献出处】 现代制造工程 ,Modern Manufacturing Engineering , 编辑部邮箱 ,2014年10期
- 【分类号】TB306;TP273
- 【下载频次】48