Talking into account limitations of traditional nanofabrication approaches such as complicated manipulation and high cost, a new friction-induced fabrication method is proposed. With the native oxidation layer as etching mask, nanofabrication of silicon can be achieved by scanning with a Si3N4 probe and subsequent selective etching in KOH solution. By optimization of the tip radius, the groove structure with small line-width can be realized on monocrystalline silicon surface. Then, etching time dependence o...
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