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基于锎源的N沟道VDMOS器件单粒子效应研究

Study on Single Event Effect of N-Channel VDMOS Based on Cf Source

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【作者】 陈佳乔哲唐昭焕王斌谭开洲

【Author】 CHEN Jia;QIAO Zhe;TANG Zhaohuan;WANG Bin;TAN Kaizhou;Sichuan Institute of Solid-State Circuits,China Electronics Technology Group Corp.;Science and Technology on Analog Integrated Circuit Laboratory;

【机构】 中国电子科技集团公司第二十四研究所模拟集成电路重点实验室

【摘要】 分析了N沟道VDMOS器件的单粒子辐射损伤机理和损伤模式,讨论了VDMOS器件的单粒子辐射加固措施。使用锎源,对采取了加固措施的一款200V高压N沟道VDMOS器件进行单粒子效应试验研究。对比分析了不同漏源电压和栅源电压以及不同真空度对VDMOS单粒子效应的影响,可为VDMOS器件的单粒子辐射加固、试验验证及应用提供参考。

【Abstract】 Single-event-effect(SEE)damage mechanism and damage mode of n-channel VDMOS were analyzed,and radiation-hardening techniques for VDMOS device were discussed.A 200Vn-channel VDMOS hardened with the proposed radiation-hardening technique was irradiated with Cf source to study single-event-effect of VDMOS devices.For the same device,SEE of VDMOS at different drain-source and gate-source voltages and different vacuum levels was analyzed.This work may serve as a reference for designing SEE hardened VDMOS device,as well as its experimentation and application.

  • 【分类号】TN386
  • 【被引频次】6
  • 【下载频次】136
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