【摘要】 100 nm步进扫描投影光刻机是我国攻关研究的主流机型,工作台是实现其超精密性能的核心子系统。光刻机工作台采用粗、微复合的运动结构,其同步最大运动平均误差(<5 nm)和同步最大运动标准偏差(<12 nm)等性能指标对运动控制系统提出严苛要求。分析硅片台与掩模台的结构特点,提出了运动控制系统中保证精度实现的组成单元,分别论述轨迹规划、测量系统、控制策略单元等的工作机理与实现特点;为进一步提高运动控制精度,分析工作台可能受到的扰动因素,提出相应的补偿控制策略,探讨运动控制中各环节的参数校准策略。综合论述步进扫描投影型光刻机工作台运动控制中的关键问题,并提出相应的实现与解决方法,可为实际光刻设备超高精度的实现提供指导。更多还原

【Abstract】 100 nm step & scan projection lithography is the prevailing one tackled in China, with its stage as one of the most critical subsystems to realize the ultra-precision performance of lithography. Rough-fine motion structure is used in the stage, and the requirements to motion control system are extremely strict because of the high performance indexes in synchronization motion(maximal moving average error is less than 5 nm and maximal moving standard deviation is less than 12 nm). The structure of wafer stage and reticle stage are analyzed, the components in motion control system which help to realize high precision are presented, and the operating principles and characteristics of trajectory planning, measurement system and control strategy are illustrated. In order to improve the control precision, disturbances deteriorating the performance of the control system are analyzed, and the corresponding compensation strategies are presented, then the strategies calibrating the controller parameters are discussed. The key points in step & scan projection lithography motion control are studied comprehensively and the corresponding solutions are presented, which can provide guidance for the ultra-precision performance of lithography equipment.更多还原