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合金内氧化法AgCdO(17)触点材料组织改善研究

Improvement in Microstructure of AgCdO(17) Contact Materials Prepared by Internal Oxidation

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【作者】 夏承东缪仁梁万岱刘立强柏小平翁桅

【Author】 XIA Cheng-dong;MIAO Ren-liang;WAN Dai;LIU Li-qiang;BAI Xiao-ping;WENG Wei;Fuda Alloy Material Co., Ltd.;

【机构】 福达合金材料股份有限公司

【摘要】 为研究Ag Cd合金的加工工艺对内氧化后的Ag Cd O触点材料组织的影响,改善高Cd含量的Ag Cd O触点材料的组织和性能,本文采用两种不同的工艺制备了Ag Cd O(17)触点材料。结果表明,新工艺制备的Ag Cd O触点较常规工艺具有组织均匀、复银界面良好的特点。这两种工艺加工触点材料组织变化源于其加工原理和组织形成机理存在着差异:常规工艺热轧发生动态再结晶,组织均匀细小,易冷轧细化和内氧化粗化;新工艺组织由大量粗大的退火孪晶组成,不易冷轧细化,内氧化过程中长大也缓慢。此外,新工艺中的退火处理分散了内氧化前与氧逆扩散富集于复银界面处的Cd原子,从而使Ag Cd O触点获得了良好的复银界面。

【Abstract】 In order to study the effects of processing technology of Ag Cd alloys on the Ag Cd O contact materials microstructures, two different processes were applied to prepare the Ag Cd O contact materials in this study. Results show that, compared with the contacts prepared by conventional process, Ag Cd O contacts prepared by the new process have homogeneous microstructure and good interface between the welding-silver layer and the Ag Cd O layer. The differences in microstructure are owing to the different processing principles and formation mechanism. Dynamic recrystallization occurs during hot rolling in the conventional process, and the homogeneous microstructure which is easy to be refined by cold rolling and coarsen in the internal oxidation treatment is obtained. A large number of annealing twins are observed in the microstructure of the new process, which are hard to be refined and grow slowly during the internal oxidation treatment. In addition, Cd atoms which enrich at the interface by reverse diffusion with oxygen before internal oxidation are dispersed by the annealing treatment in the new process, so the good interface of Ag Cd O can be achieved.

  • 【文献出处】 电工材料 ,Electrical Engineering Materials , 编辑部邮箱 ,2014年06期
  • 【分类号】TQ131.22
  • 【被引频次】3
  • 【下载频次】130
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