【摘要】 大面积纳米压印是一种高效、低成本和批量化制造大面积微纳米结构的方法,已经被看作最具有工业化应用前景的微纳米制造方法之一.脱模是当前大面积纳米压印所面临的最大挑战性问题,是制约大尺寸晶圆级纳米压印进入工业化应用最大的瓶颈."揭开"式脱模已经被认为是实现大面积纳米压印最为有效的一种脱模方法,本文开展了大面积纳米压印揭开式脱模理论建模和数值模拟的研究.基于应变能法,并结合脱模过程中能量的守恒,建立了"揭开"式脱模预估脱模力理论模型.以光栅图形垂直式脱模为例,建立了目前工业界广泛采用的气体辅助揭开式脱模在脱模过程中所需气压脱模力理论模型.利用ABAQUS工程模拟软件,揭示了模具材料特性、特征图形几何参数对于"揭开"式脱模影响规律.该研究为大面积纳米压印工艺奠定重要理论基础,并为晶圆级纳米压印工艺优化和压印装备开发与性能的改进提供理论基础和方向性指导.更多还原

【Abstract】 Nanoimprint lithography(NIL) is an emerging nanopatterning approach for producing large-area micro/nano scale structures with low cost, high throughput and high resolution. Demolding has now been considered as one of the most challenging issues for large area NIL, and a bottleneck hindering the industrialization of full wafer NIL. Peel demolding mode has been proven to be an effective way implementing large area nanoimprinting. This paper investigated the theoretical model and numerical simulation of peel demolding for large are NIL. A general model estimating demolding force was established based on the combination of the strain energy method and the conservation of energy in demolding stage. The required separating force for vertical demolding of grating patterns was achieved using the proposed model. Furthermore, the influence of the properties of mold materials and the aspect ratio of feature patterns for peel demolding was revealed by numerical simulation using ABAQUS software. These findings are valuable in providing a theoretical basis for large area NIL, optimizing demolding process and further enhancing the performance of full wafer NIL tool.更多还原