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氢等离子体辅助固相晶化多晶硅薄膜的初步研究
The preliminary investigation of hydrogen plasma assisted solid phase crystallization polycrystalline silicon film
【摘要】 提出一种氢等离子辅助固相晶化(hydrogen plasma assisted solid phase crystallization,H-SPC)多晶硅的新颖技术。这一晶化技术能够明显缩短晶化时间,同时有效钝化多晶硅薄膜的缺陷态。首先对氢等离子辅助SPC技术与传统SPC技术进行比较分析,进而研究了晶化过程中各种工艺条件对多晶硅晶化质量的影响并进行了物理机制的初步分析。
【Abstract】 In this paper,a novel technology of hydrogen plasma assisted solid phase crystallization polysilicon was proposed. This crystallization technology can not only reduce the crystallization time but also passivate defects in the poly-Si thin films effectively. We compared the H-SPC with traditional SPC firstly,and then,investigated the influence of process conditions on the quality of the resultant polysilicon. In addition,we studied the physical mechanism of this crystallization technology.
【关键词】 氢等离子体;
多晶硅薄膜;
固相晶化;
薄膜晶体管(TFT);
【Key words】 hydrogen plasma; poly-silicon thin film; solid phase crystallization; thin film transistors(TFT);
【Key words】 hydrogen plasma; poly-silicon thin film; solid phase crystallization; thin film transistors(TFT);
【基金】 国家自然科学基金资助项目(61076006);国家高技术研究发展计划(863计划)资助项目(2008AA06A335)
- 【文献出处】 功能材料 ,Journal of Functional Materials , 编辑部邮箱 ,2014年19期
- 【分类号】O53;O484
- 【被引频次】1
- 【下载频次】79