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溅射工艺对Cu/SiO2/Ni80Fe20复合结构丝形貌及磁性能影响
Effect of sputtering technology on the microstructure and magnetic properties of Cu/SiO2/Ni80Fe20 composite wires
【摘要】 利用射频磁控溅射方法在自旋的Cu上制备了Cu/SiO2和Cu/SiO2/Ni80Fe20两个系列复合结构丝。利用扫描电镜、阻抗分析仪分析了溅射SiO2时基底丝旋转速率对复合结构丝的表面微观结构和巨磁阻抗效应的影响。实验结果表明,镀层表面颗粒大小随着制备SiO2时转速的增加先减小后增大,Cu/SiO2/Ni80Fe20复合结构丝的巨磁阻抗效应则随着转速的增加先增大后减小。
【Abstract】 In this work,Cu/SiO2and Cu/SiO2/Ni80Fe20composite wires were prepared by RF magnetron sputtering on the rotating substrate of Cu.The influence of the rotating rates during sputtering SiO2on the microstructure and giant magnetoimpedance(GMI)effect of the composite wires was investigated by the methods of SEM and impedance analyzer.The results showed that with the increase of the rotating rate,the particle size of the film surface first decreased and then increased,while the GMI effect of the Cu/SiO2/Ni80Fe20composite wires first increased and then decreased.
- 【文献出处】 功能材料 ,Journal of Functional Materials , 编辑部邮箱 ,2014年10期
- 【分类号】TM271.2
- 【被引频次】3
- 【下载频次】59