【摘要】 在室温条件下采用磁控溅射技术在涤纶机织物表面沉积金属薄膜,利用扫描电镜(SEM)和原子力显微镜(AFM)观察纳米金属薄膜的表面形貌,通过分别改变磁控溅射工艺参数溅射时间、溅射功率和气体压强,研究其对试样抗静电性能的影响。实验结果表明,溅射时间和溅射功率对镀金属薄膜试样的抗静电性能均影响较大,而气体压强影响相对较小。溅射时间40min、溅射功率120W、气体压强1.6Pa工艺条件下,镀Cu膜试样的抗静电性能最好;溅射时间40min、溅射功率120W、气体压强1Pa或1.6Pa工艺条件下,镀Ag膜试样的抗静电性能最好,而且镀Ag比镀Cu薄膜试样的抗静电性能更优异。更多还原

【Abstract】 Nanoscale metal thin films were deposited on polyester fabric by magnetron sputtering at room temperature.The surface morphology of the nanoscale metal thin films was observed using scanning electron microscope(SEM)and atomic force microscope(AFM).Antistatic properties of the films prepared by changing one of sputtering process parameters,such as sputtering time,sputtering power or gas pressure re investigated.The results of the experiments show that the antistatic property of nanoscale metal thin films is greatly influenced by the sputtering time and sputtering power,and is slightly affected by the gas pressure.The samples coated with copper films in the condition of 40 min of sputtering time,120 W of sputtering power and 1.6Pa of gas pressuregives excellent antistatic property;and the samples coated with silver films in the condition of 1Pa or 1.6Pa of gas pressure otherwise the same as above show a high antistatic property,is actually better than that of the sample coated with copper.更多还原