【摘要】 为了经济、有效、准确地在线测量光学薄膜厚度,采用射频磁控反应溅射法在玻璃衬底上制备TiO2薄膜。用自制的简易监测系统对TiO2薄膜在生长过程中的沉积速率进行了即时测量,研究了射频功率、气体流量、工作气压等工艺参数对TiO2薄膜沉积速率的影响规律。结果表明:沉积速率监测系统对膜厚变化反应灵敏,能够实时监测薄膜生长速率;溅射过程中,射频功率、氧氩流量比和工作气压对薄膜沉积速率有较大的影响,射频功率从120 W增加到240 W,薄膜沉积速率增加;氧气流量从1 mL/min增加到5 mL/min,薄膜沉积速率先逐渐增大后减小,存在一个临界点;工作气压从0.3 Pa增加到0.8 Pa,薄膜沉积速率缓慢增加,但临界点后迅速下降。更多还原

【Abstract】 TiO₂ films were prepared on glass substrates using a radio frequency（RF） reactive magnetron sputtering facility.A monitoring system was constructed to in-situ measure the deposition rate of TiO₂ film.The influences of RF power,oxygen flow rate and working pressure on the deposition rate of TiO₂ films were studied.Results indicated that the deposition rate monitoring system was responsive to changing film thickness and could efficiently realize real-time monitoring.RF power,oxygen/argon flow ratio and working pressure had significant influences on the deposition rate.Namely,the deposition rate of TiO₂ film increased with increasing RF power in the range of 120 240 W,and it initially increased but decreased later with increasing oxygen flow in the range of 1 5 mL/min.Moreover,the deposition rate initially rose slowly with increasing working pressure in the range of 0.3 0.8 Pa and reached a maximum,and finally it decreased rapidly above the critical working pressure.更多还原