Textured silicon(Si) substrates decorated with regular microscale square pillar arrays of nearly the same side length,height,but different intervals are fabricated by inductively coupled plasma,and then silanized by self-assembly octadecyltrichlorosilane(OTS) film.The systematic water contact angle(CA) measurements and micro/nanoscale hierarchical rough structure models are used to analyze the wetting behaviors of original and silanized textured Si substrates each as a function of pillar interval-to-width r...
【英文摘要】
Textured silicon(Si) substrates decorated with regular microscale square pillar arrays of nearly the same side length,height,but different intervals are fabricated by inductively coupled plasma,and then silanized by self-assembly octadecyltrichlorosilane(OTS) film.The systematic water contact angle(CA) measurements and micro/nanoscale hierarchical rough structure models are used to analyze the wetting behaviors of original and silanized textured Si substrates each as a function of pillar interval-to-width r...
【基金】
Project supported by the Program for New Century Excellent Talents in University of Ministry of Education of China (Grant No.NCET-09-0211);
the Fundamental Research Funds for the Central Universities (Grant Nos.2012YJS105 and M13JB00240)
【更新日期】
2014-03-06
【分类号】
TN304.12
【正文快照】
1.IntroductionAs the size of a device shrinks to micro/nanoscale,theeffects of surface forces such as adhesion,friction,and sur-face tension become increasingly critical and dominate overinertial,electromagnetic,and gravitational forces.[1]Exces-sive adhe
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