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An AlGaN/GaN HEMT with enhanced breakdown and a near-zero breakdown voltage temperature coefficient

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【作者】 谢刚汤岑汪涛郭清张波盛况Wai Tung Ng

【Author】 Xie Gang a)b),Tang Cen a),Wang Tao a),Guo Qing a),Zhang Bo c),Sheng Kuang a),and Wai Tung Ng b) a)College of Electrical Engineering,Zhejiang University,Hangzhou 310027,China b)The Edward S.Rogers Sr.Electrical and Computer Engineering Department,University of Toronto,Toronto,Ontario,Canada,M5S 1A1 c)State Key Laboratory of Electronic Thin Films and Integrated Devices,University of Electronic Science and Technology of China,Chengdu 610054,China

【机构】 College of Electrical Engineering,Zhejiang UniversityThe Edward S.Rogers Sr.Electrical and Computer Engineering Department,University of Toronto, Toronto,Ontario,Canada,M5S 1A1State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China

【摘要】 An AlGaN/GaN high-electron mobility transistor(HEMT) with a novel source-connected air-bridge field plate(AFP) is experimentally verified.The device features a metal field plate that jumps from the source over the gate region and lands between the gate and drain.When compared to a similar size HEMT device with a conventional field plate(CFP) structure,the AFP not only minimizes the parasitic gate to source capacitance,but also exhibits higher OFF-state breakdown voltage and one order of magnitude lower drain leakage current.In a device with a gate to drain distance of 6 μm and a gate length of 0.8 μm,three times higher forward blocking voltage of 375 V was obtained at VGS =-5 V.In contrast,a similar sized HEMT with a CFP can only achieve a breakdown voltage no higher than 125 V using this process,regardless of device dimensions.Moreover,a temperature coefficient of 0 V/K for the breakdown voltage is observed.However,devices without a field plate(no FP) and with an optimized conventional field plate(CFP) exhibit breakdown voltage temperature coefficients of-0.113 V/K and-0.065 V/K,respectively.

【Abstract】 An AlGaN/GaN high-electron mobility transistor(HEMT) with a novel source-connected air-bridge field plate(AFP) is experimentally verified.The device features a metal field plate that jumps from the source over the gate region and lands between the gate and drain.When compared to a similar size HEMT device with a conventional field plate(CFP) structure,the AFP not only minimizes the parasitic gate to source capacitance,but also exhibits higher OFF-state breakdown voltage and one order of magnitude lower drain leakage current.In a device with a gate to drain distance of 6 μm and a gate length of 0.8 μm,three times higher forward blocking voltage of 375 V was obtained at VGS =-5 V.In contrast,a similar sized HEMT with a CFP can only achieve a breakdown voltage no higher than 125 V using this process,regardless of device dimensions.Moreover,a temperature coefficient of 0 V/K for the breakdown voltage is observed.However,devices without a field plate(no FP) and with an optimized conventional field plate(CFP) exhibit breakdown voltage temperature coefficients of-0.113 V/K and-0.065 V/K,respectively.

【基金】 Project supported by the Delta Science & Technology Educational Development Program (Grant No. DREK2010001);the Zhejiang Provincial Natural Science Foundation of China for Distinguished Young Scholars (Grant No. R1100468)
  • 【文献出处】 Chinese Physics B ,中国物理B , 编辑部邮箱 ,2013年02期
  • 【分类号】TN386
  • 【被引频次】1
  • 【下载频次】86
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