【摘要】 运用射频磁控溅射技术,改变氩氧流量比在玻璃衬底上生长ZnO∶Al(ZAO)样品,采用XRD、紫外-可见分光光度计对薄膜微结构、厚度及其光学性能表征,结果发现:维持氩流量不变(9 sccm),随着氧流量增加(1～9 sccm),样品XRD峰强减小,半高宽增大,晶粒尺寸减小,薄膜结晶性能变差;而维持氧流量不变(9 sccm),氩流量减小(9～3 sccm),样品XRD峰强增大,半高宽减小,晶粒尺寸变大,结晶性能变好。紫外可见光光谱在400～900nm波长区间平均透射率差异大(67.9%～91.1%);在420～900 nm波长区间平均透光率高且差异小(90.2%～92.4%)。更多还原

【Abstract】 ZnO ∶ Al thin films were fabricated on glass substrate by radio frequency reactive magnetron sputtering technique. The microstructure and optical properties of the thin films were characterizated by XRD and UV-visible spectrophotometer. The results showed that peak intensity decreased but FWHM increased with oxygen flow increased from one to nine sccm and argon flow fixed at 9 sccm,indicating that the crystalline properties of films were deteriorated with grain size decreasing. However the peak intensity increased but FWHM decreased with argon flow decreased from nine to three sccm and oxygen flow fixed at9 sccm,indicating that crystallization properties becamed better with grain size increasing. There were a large fluctuations difference from 67. 9% to 91. 1% in the average transmittance of visible spectrum between 400 nm and 900 nm wavelenth but small fluctuations from 90. 2% to 92. 4% between 420 nm and900 nm wavelength.更多还原