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倒装芯片组装中微米级互连焊点的界面金属间化合物生长及动力学

Interfacial intermetallic compound growth and kinetic in the micro-solder joint of flip chip assembly

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【作者】 田野吴懿平安兵龙旦风

【Author】 Tian Ye1,Wu Yiping1,An Bin1,Long Danfeng2(1.College of Materials Science and Engineering,Huazhong University of Science and Technology,Wuhan Hubei 430074,China; 2.Department of Precision Instruments and Mechanology,Tsinghua University,Beijing 100084,China)

【机构】 华中科技大学材料科学与工程学院清华大学精密仪器与机械学系

【摘要】 利用焊点间距为100μm,高度约为45μm,成分为Sn-3.0Ag-0.5Cu(wt%)(SAC305)的倒装硅芯片与BT树脂基板组装互连,分别在150、125和100℃条件下时效至650 h。研究时效过程中界面主要金属间化合物的生长,结合经验功率定律及阿伦斯公式计算基板侧Cu焊盘界面IMC生长的动力学参数,对IMC的生长动力学探讨。结果表明,在互连回流后,双侧焊盘界面主要IMC为(Cu,Ni)6Sn5。在时效前100 h,(Cu,Ni)6Sn5生长速率较快;而在随后的时效过程中,随时效时间的增加生长速率逐渐降低。界面主要金属间化合物(Cu,Ni)6Sn5生长动力学研究结果可知:150、125以及100℃条件下时间参数分别为2.61、2.35和2.18,界面(Cu,Ni)6Sn5的生长激活能为67.89 kJ/mol。

【Abstract】 The flip chip with Sn-3.0Ag-0.5Cu(wt%) solder joints were assembled onto BT substrate,and solder joint had stand-off height of approximately 45 μm and pitch of 100 μm.After assembly,the flip-chip assemblies were isothermally aged at 150,125 and 100 ℃ for up to 650 h.This work studies intermetallic growth and kinetics in solder joints on Cu pad surface by empirical power law and Arrhenius equation through thermal aging.The results show that,after the reflow of flip chip,the(Cu,Ni)6Sn5 forms as the dominant interfacial IMC on the both pad interfaces.During thermal aging,before 100 h,the growth rate of(Cu,Ni)6Sn5 is quicker,while after 100 h,the growth rate becomes slower and slower.The result of the calculated kinetic parameter shows the time exponents are 2.61,2.35 and 2.18 at 150,125 and 100 ℃ respectively,and the activation energy of(Cu,Ni)6Sn5growth is 67.89 kJ/mol.

  • 【文献出处】 金属热处理 ,Heat Treatment of Metals , 编辑部邮箱 ,2013年03期
  • 【分类号】TN405
  • 【被引频次】6
  • 【下载频次】195
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