【摘要】 显微镜透射光照射下数字图像的光照不均匀校正是图像处理中的一个难题。传统的掩模法和背景拟合法由于受到应用场景的限制,并且背景拟合法校正后图像亮度偏暗,具有一定的应用局限性。结合传统算法的计算量小、校正速度快的优点,提出了一种基于掩模法和背景拟合法的校正方法。该方法通过选取图像分割区域中的亮度最大值作为采样点,提高了校正后图像的整体亮度,并利用采样点的平均值来进行插值获取背景估计图,最终利用掩模法来实现图像的快速校正。通过对校正后图像的亮度均值、亮度均匀性和图像细节三个评价指标的对比,证明该方法校正速度快、效果好,能适用于显微镜的光照环境。更多还原

【Abstract】 The digital image correction of uneven illumination under microscope transmittance is a problem in image processing.Traditional mask method and background fitting method are restricted due to application scenarios,and the corrected image brightness is low by using background fitting method,so it has some limitations of the application.The traditional algorithm has advantages of low calculation and high correction speed.Combining with above characteristics,a new correction method was proposed based on the mask method and background fitting method.This method selected the maximum brightness as the sampling point in the region of the image segmentation.It improved the overall brightness of the corrected image,interpolated the average of the sampling points to obtain background estimation image,and finally completed image correction through the mask method.By contrasting three evaluation indicators of the corrected image,luminance means,luminance uniformity and image detail,this correction method is proved effective in the microscope illumination environment.更多还原