【摘要】 在光学系统偏振传输理论的基础上,对一高数值孔径(NA)的透射式光刻系统进行了偏振分析,分析中考虑了系统的实际特性——现有工艺水平可制备的增透膜、薄膜和基底材料的吸收作用以及偏振照明,以增加分析结果的可靠性。通过计算系统各光学界面的透射率、反射率、吸收率及二次衰减值等偏振参数,得到镀膜、吸收作用以及不同偏振照明对系统传输性能和成像性能的影响。结果表明镀膜能有效提高该光刻系统的性能及稳定性,并可以将不同偏振照明对该系统性能的影响减小至可忽略的水平;同时,显著的基底吸收作用是该系统能量损失的主因,但吸收引入的偏振作用相对总体而言较小。更多还原

【Abstract】 Based on the polarization transmission theory in optical system,the polarization analysis of a real high numerical aperture(NA)refractive optical lithography system is made,where the anti-reflection coating within current technology,the absorption in coating and base,and polarized illumination are taken into account to obtain a higher-reliability result. Several polarization parameters at every optical interface are calculated,such as transmission,reflection,absorptance and diattenuation,to achieve the effects of anti-reflection coating,absorption of the materials and polarized illumination on transmission performance and imaging performance.The results reveal that the anti-reflection coating can dramatically enhance the performance and stability of this sample system,while reducing the effects of varied polarized illumination to a negligible degree.Besides,the dramatic absorption in the base material plays a main role in the intensity loss,and the absorption has a small contribution to overall polarization effects.更多还原