【摘要】 在固结磨料化学机械抛光中,工件表面与抛光介质易发生水解反应,产生软化层,而软化层厚度直接影响材料去除速率及表面质量。本文采用显微硬度计测量了不同介质条件下水晶表面的变质层厚度,并基于CP-4研磨抛光平台研究了不同抛光介质及温度对材料去除速率的影响,进而在线测量了抛光过程中声发射信号及抛光垫与工件之间摩擦系数的变化。结果表明:六偏磷酸钠的加入可促进水晶玻璃表层网络结构断裂,软化表层,软化层厚度随着浸泡时间、温度升高而增加,进而提高了水晶玻璃的去除率;而且随着温度升高,水解作用更加明显。实验显示,声发射信号及摩擦系数实时测量对抛光工艺参数的优化具有指导意义。更多还原

【Abstract】 In chemical mechanical polishing by a fixed-abrasive pad,the hydrolysis between workpiece and slurries will form a softened layer on the glass substrate to effect on the Material Removal Rate(MRR) and surface quality.The influence of polishing slurries on the surface hardness of decorative glass is analyzed by the micro-hardness method in this paper.The effects of different slurries and temperatures on the MRR were investigated using a CP-4 lapping and polishing platform.Both the dynamic Acoustic Emission(AE) and Coefficient of Friction(COF) were continuously monitored in-situ during the polishing process.The results show that the network structure on the decorative glass surface is collapsed when the sodium hexametaphosphate was added to the slurries,and this layer is softer than the glass,which improved the material removal rate.With the temperature increased,the hydrolysis effect is more obviously.Direct real-time monitoring of AE and COF can offer constructive significance for optimizing process parameters of polishing.更多还原