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PCVD直流脉冲沉积温度对TiN/TiSiN复合涂层高温氧化性能的影响

Influence of PCVD DC Pulse Deposited Temperature on High Temperature Oxidation Resistance of TiN /TiSiN Multilayer Coatings

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【作者】 宋之敏曾天韩纪梅高见李洪林丁武成刘岁林郑淑萍

【Author】 Song Zhimin;Zeng Tian;Han Jimei;Gao Jian;Li Honglin;Ding Wucheng;Liu Suilin;Zheng Shuping;Analytical & Testing Center,Sichuan University;

【机构】 四川大学分析测试中心四川大学材料科学与工程学院成都工具研究所有限公司

【摘要】 采用工业用直流脉冲等离子体增强化学气相沉积(PCVD)法在硬质合金刀具材料上制备了TiN/TiSiN复合涂层。对比研究了TiN及不同温度制备的TiN/TiSiN复合涂层高温抗氧化性能。研究表明:含有非晶阻隔抗氧化结构Si3N x的TiN/TiSiN复合涂层高温氧化性能远高于TiN涂层,TiN/TiSiN复合涂层提高到800℃,仍可避免出现较大面积氧化及脱落;PCVD直流脉冲沉积制备温度对涂层高温抗氧化能力有重要影响,550℃沉积制备的致密、均匀、颗粒小的复合涂层高温氧化性能最佳,600℃次之,500℃最差。

【Abstract】 The TiN coating and TiN /TiSiN multilayer coatings were deposited on substrate of WC-Co cutting tools using an industrial dc pulsed plasma chemical vapor deposition( PCVD). The high temperature oxidation resistance performance of the coatings were investigated. The high temperature oxidation resistance performance of TiN / TiSiN multilayer coatings were obviously better than that of TiN coating. The deposited temperature of dc pulse PCVD method Influences importantly on the high temperature oxidation resistance of TiN / TiSiN multilayer coatings. The high temperature oxidation resistance performance of TiN / TiSiN coated in the 550℃ is the best among that of the three TiN / TiSiN coatings. The performance of TiN / TiSiN coating deposited in the 500℃ is the worst. The that in the 600℃ is the middle.

  • 【分类号】TG174.44
  • 【下载频次】138
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