【摘要】 采用磁控溅射方法,制备了大面积(300mm×300mm)ZnO:Al薄膜作为CIGS太阳电池的窗口层。设计以电阻率和透过率测试值的标准差乘积作为衡量大面积低阻ZnO窗口层的均匀性标准,确定4mm/s作为衬底与靶材最合适的相对行走速度,并进一步研究工作气压和溅射功率对ZnO:Al薄膜结构、电学特性和光学特性的影响,实现在400～1 200nm波长范围内平均透过率大于85%,电阻率ρ约1.0×10-3Ω.cm。试验结果表明,改善的工艺条件能得到大面积内厚度均匀、光电特性良好的低阻ZnO窗口层。更多还原

【Abstract】 The main content of this research is to optimize the properties of window layers for large-area CIGS solar cells,and the ZnO:Al films are deposited by magnetron sputtering.The product of standard deviation of resistivity and the transmittance is made as a uniform standard to measure large-area ZnO window layer to confirm the best speed of substrate.Then the structural electrical and optical properties of ZnO:Al films deposited with different powr levels and pressures are investigated,and the optimum process condition of window layer for solar cells is confirmed.The structural,electrical and optical properties of ZnO:Al films obtained at different conditions are characterized by means of scanning electron microscopy(SEM).Hall measurement and spectrophotometry.After comparison of the uniformities of ZnO:Al films deposited with different substrate speeds,4 nm/s is confirmed as the best one.The lowest resistivity obtained in this study is 1.0×10-3 Ω·cm and the average transmittance is above 85% in the wavelength range of 400-1 200 nm.It is found that ZnO window layer films with uniform thickness,excellent electrical and optical properties could be obtained under improved process conditions.更多还原