【摘要】 针对大面积且高密度PCB光刻,利用ZEMAX光学设计软件,设计了一种8片式光刻投影物镜。该物镜采用对称双高斯结构,放大倍率为-1,数值孔径NA=0.06,单次曝光面积Φ=80mm,具有优于7μm的分辨力和120μm的焦深。通过对该镜头进行公差分析,表明最紧公差为部分元件倾斜要小于0.017°。用MonteCarlo方法模拟了制造50组镜头的成像质量,得到在空间频率72line/mm处,90%的镜头的MTF>0.58,因此加工装配时能保证90%以上的成品率。更多还原

【Abstract】 For large-area and high-density Printed Circuit Board(PCB) lithography,we use ZEMAX optical design software to design a kind of lithographic projection lens with 8 optics element.Symmetrical double Gaussian structure is applied in the lens,the magnification is-1,and numerical aperture NA = 0.06.It can exposure a area of Φ = 80 mm at a time,and have better than 7 μm resolution and 120 μm focus shift.The result of tolerance analysis show that the tightest tolerance is part of the element tilts,which should be lower than 0.017 °.We use the Monte Carlo method to simulate fabricating and assembling 50 group of lens.The results show 90% of the lens MTF > 0.58 at spatial frequency 72 line/mm,which can ensure more than 90% yield when they are fabricated and assembled.更多还原