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Effect of Internal Antenna Coil Power on the Plasma Parameters in 13.56 MHz/60 MHz Dual-Frequency Sputtering

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【作者】 黄福培杨麒正叶超葛水兵宁兆元

【Author】 HUANG Fupei;YANG Chicheng;YE Chao;GE Shuibing;NING Zhaoyuan;School of Physics Science and Technology,Jiangsu Key Laboratory of Thin Films,Soochow University;Department of Physics,National Tsing Hua University;

【机构】 School of Physics Science and Technology,Jiangsu Key Laboratory of Thin Films,Soochow UniversityDepartment of Physics,National Tsing Hua University

【摘要】 The plasma property of a hybrid ICP/sputtering discharge driven by13.56 MHz/60 MHz power sources was investigated by Langmuir probe measurement.For the pure sputtering discharge,the low electron density and ion flux,the rise of floating potential and plasma potential with increasing power,as well as the bi-Maxwellian distribution of electron energy distributions(EEDFs)were obtained.The assistance of ICP discharge led to the effective increases of electron density and ion flux,the suppression of rise of floating potential and plasma potential,as well as the change of EEDFs from bi-Maxwellian distribution into Maxwellian distribution.The increase of electron density and ion flux,and the EEDFs evolution were related to the effective electron heating by the induced electric field.

【Abstract】 The plasma property of a hybrid ICP/sputtering discharge driven by 13.56 MHz/60 MHz power sources was investigated by Langmuir probe measurement.For the pure sputtering discharge,the low electron density and ion flux,the rise of floating potential and plasma potential with increasing power,as well as the bi-Maxwellian distribution of electron energy distributions(EEDFs)were obtained.The assistance of ICP discharge led to the effective increases of electron density and ion flux,the suppression of rise of floating potential and plasma potential,as well as the change of EEDFs from bi-Maxwellian distribution into Maxwellian distribution.The increase of electron density and ion flux,and the EEDFs evolution were related to the effective electron heating by the induced electric field.

【基金】 supported by National Natural Science Foundation of China(Nos.11275136,10975105,11075114)
  • 【文献出处】 Plasma Science and Technology ,等离子体科学和技术(英文版) , 编辑部邮箱 ,2013年12期
  • 【分类号】TN820
  • 【被引频次】2
  • 【下载频次】23
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