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纳米硅溶胶在防反射薄膜中的应用研究

Study on Applicationg of The Nano-silica Sol in Anti-reflection Thin Film

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【作者】 张丽惠张希堂盖树人王广伟

【Author】 ZHANG Li-hui,ZHANG Xi-tang,GAI Shu-ren,WANG Guang-wei(China Lucky Group Corporation,Baoding 071054,China)

【机构】 中国乐凯集团有限公司

【摘要】 采用辐射聚合法制备了防反射涂覆液,低折材料采用含氟单体和纳米硅溶胶,涂覆液中加入了溶剂、UV固化单体、引发剂、流平剂等助剂,在三醋酸纤维素基材上用丝棒涂布制备了防反射薄膜。研究了纳米硅溶胶的分散介质、粒径大小及其用量对防反射薄膜雾度、折射率、反射率等性能的影响。

【Abstract】 Anti-reflective coating solutions were prepared by means of radiation polymerization.fluorine monomer and nano-silica sol were used as low reflection materials,at the same time,solvents,UV-curing momomer,initiator and levelling agent were also added as auxiliary agents to the coating solution.Anti-reflective film was rod coated onto the TAC substrate.The effects of dispersion medium,size and amount of particles of nano-silica sol on the properties,such as fog,refraction and reflection of the anti-reflection film were investigated.

  • 【文献出处】 信息记录材料 ,Information Recording Materials , 编辑部邮箱 ,2013年01期
  • 【分类号】TB383.2
  • 【被引频次】2
  • 【下载频次】214
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