【摘要】 采用溶胶-凝胶法在硅片基底上制备ZrO2薄膜,在150℃～750℃范围内不同温度下进行热处理,研究了热处理对膜层结构和光学性能的影响。X射线反射用于膜层厚度和界面粗糙度分析,结果表明热处理温度由150℃升至750℃,膜层厚度由常温状态下的112.3nm减小到34.0nm,表面和界面粗糙度均小于2nm。以X射线反射法测得的膜层厚度为初始值,对椭圆偏振仪的测量结果进行拟合,得到不同温度的膜层折射率,结果表明热处理温度为550℃时膜层折射率达到最大值。X射线反射作为直接的膜层厚度测试手段,所得结果为准确分析椭偏光谱提供了参考。更多还原

【Abstract】 ZrO2 thin films were first deposited by the sol-gel method on Si substrates and then heat-treated from 150℃ to 750℃.X-ray reflectivity and spectroscopic ellipsometry were employed to determine the structural and optical parameters of the films at different annealing temperatures.X-ray reflectivity accurately provided film thickness and interface roughness.The results indicate that,with increasing temperature from 150℃ to 750℃,the films shrank from 112.3 nm to 34.0 nm and the surface roughness as well as the interface roughness was less than 2 nm.The film thickness from X-ray reflectivity was used as an initial value for the evaluation of the spectroscopic ellipsometry data to reveal the film refractive index as a function of temperature.Heat treatments from 150℃ to 750℃ result in first an continuous increase of refractive index from 1.648(at 633 nm) to 1.955 and then a decrease to 1.936 with the watershed temperature of 550℃.The combination of X-ray reflectivity and spectroscopic ellipsometry can improve the reliability of optical characterization for optical films.更多还原