节点文献

薄膜理想台阶的制备方法研究

Study on the Preparation Method for Ideal Steps in Thin Films

  • 推荐 CAJ下载
  • PDF下载
  • 不支持迅雷等下载工具,请取消加速工具后下载。

【作者】 付文博梁建华王维笃周晓松杨本福程贵均

【Author】 FU Wen-bo;LIANG Jian-hua;WANG Wei-du;ZHOU Xiao-song;YANG Ben-fu;CHENG Gui-jun;Institute of Nuclear Physics and Chemistry China Academy of Engineering Physics;

【机构】 中国工程物理研究院核物理与化学研究所

【摘要】 目的研究台阶的形貌对台阶仪测试的影响,准确测试薄膜的厚度。方法分析制备台阶中存在的问题,针对这些问题设计了中轴线位置带掩膜条的掩膜板,并采用该新型掩膜板,在不同衬底上制备台阶,用台阶仪对薄膜的厚度进行测定。结果在薄膜中轴线附近做出的台阶,坡度陡峭,上下表面清晰。Mo衬底上制备出的薄膜厚度重复性较好;单晶硅衬底上制备的薄膜表面粗糙度较大;石英衬底上制备薄膜形成的台阶上下表面均较为平滑。结论使用新型掩膜板在石英衬底上制备出理想台阶,可较为准确地测试薄膜的厚度。

【Abstract】 Objective To study the impact of the morphology of steps on the level meter measurement,and to accurately test the thickness of the films. Methods The problems in the preparation of steps were analyzed,the meddle line strip mask was designed based on these problems,and the new mask was used to prepare steps on different substrates,and then the thickness of the films was measured by level meter. Results The steps near the meddle line of thin films had steep slope,and the upper and lower surfaces were clear. The thickness of the films prepared on the polished Mo substrate had good reproducibility; the films on single crystal silicon substrate had large surface roughness; the upper and lower surfaces of the steps of films prepared on quartz substrates were the smoothest. Conclusion The use of new mask can help to prepare the ideal steps on quartz substrates for relatively accurate test of the film thickness.

【关键词】 薄膜膜厚边缘效应理想台阶粗糙度
【Key words】 thin filmsfilm thicknessedge effectthe ideal steproughness
【基金】 中国工程物理研究院科技发展基金资助项目(2010A0301011)~~
  • 【文献出处】 表面技术 ,Surface Technology , 编辑部邮箱 ,2013年06期
  • 【分类号】O484.5
  • 【被引频次】6
  • 【下载频次】260
节点文献中: 

本文链接的文献网络图示:

本文的引文网络