【摘要】 采用双槽电化学腐蚀法制备多孔硅(porous silicon,PS),对其进行超声后处理.以PS为模板采用一步浸渍沉积法制备大小均匀、形状规则的铜纳米颗粒,并研究沉积时间对纳米颗粒形状、尺寸的影响.结果表明:PS超声后处理并未造成其物理和化学结构的破坏,大量的硅氢键(SiH x)和蜂窝状多孔结构(直径150 nm左右)分别为纳米铜的形成和生长提供了还原剂和场所;沉积时间对铜纳米颗粒形貌具有重要影响,当沉积时间为40 s时得到形状和尺寸较为均匀的铜纳米颗粒.更多还原

【Abstract】 Porous silicon(PS) was prepared by the double-cell electrochemistry corrosion,and undergone an ultrasonic post-treatment after etching.The Cu nanoparticles with the uniform size and regular shape were prepared by one step impregnation on the treated PS template.The effect of deposition time on shapes and sizes of nanoparticles was investigated.Results show that ultrasonic post-treatment does not destroy the physical and chemical structure of PS,plenty of SiHx species and honeycomb-like porous structure(about 150 nm) provide reduction and site of formation and growth of Cu nanoparticles,respectively.The deposition time plays a key role on the shape and size of Cu nano-particles,and Cu nano-particles with the uniform size and regular shape are obtained when the time was 40 s.更多还原