【摘要】 微波等离子体化学气相沉积(MPCVD)法是目前最有发展前景的高质量金刚石薄膜沉积方法之一,但由于谐振腔中微波与等离子体之间强烈的相互作用,人们很难根据经验对谐振腔进行改进,本文利用HFSS软件对不锈钢式MPCVD的谐振腔进行了模拟,通过分析谐振腔内电场以及等离子体的分布,对谐振腔的主要参数进行了优化处理,并根据模拟结果设计出谐振腔系统,在一定条件下,沉积出了优质的金刚石膜,沉积速率可达到0.33μm/h。更多还原

【Abstract】 A novel type of the cylindrical resonator,dedicated to diamond film growth reactor by microwave power chemical deposition(MPCVD),was developed to eliminate the strong interaction between the microwave and plasma in the resonator.The cylindrical resonator,made of stainless steel,was modeled and simulated with the software package HESS.The distributions of both the electric field and the plasma were calculated,and the structure optimization was performed on the basis of the simulated results.High quality diamond films were grown with the lab-built,prototyped MPCVD reactor equipped with the newly-developed cylindrical resonator.The deposition rate was found to be 0.33 μm/h.更多还原