【摘要】 TiZrV合金在180℃下加热24 h即可激活,是迄今发现的激活温度最低的非蒸散型吸气剂,已在粒子加速器领域得到应用。采用直流磁控溅射法在不锈钢管道内壁获得了TiZrV薄膜,并研究了薄膜对CO和H2的吸气性能。在200℃下加热24 h后TiZrV对CO和H2的抽速分别为0.23和0.02 L.s-1.cm-2,吸气容量分别为6.8×10-5和6.6×10-2Pa.L.cm-2,且随着激活温度和时间的增加,吸气性能会有所提高。更多还原

【Abstract】 The TiZrV films,as a non-evaporable getter(NEG) material,were deposited on the inner walls of stainless tube by DC magnetron sputtering.The impacts of the deposition and activation conditions on the gas absorption characteristics of the TiZrV films were evaluated.The tests with CO and H2 gases were conducted after the setup was baked at 200℃ for 24 h.The results show that the TiZrV films works well as a NEG material.It has a pumping speed of 0.23 L·s-1·cm-2 and an absorption capacity of 6.8×10-5 Pa·L·cm-2 for CO,and the counter parts for H2 are 0.02 L·s-1·cm-2 and 6.6×10-2 Pa·L·cm-2,respectively.We found that the gettering performance improves,as the activation temperature rises up and lasts for a longer time.更多还原