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脉冲参数对电解金属锰的影响

The Influence of Pulse Parameters on Manganese Electrodeposition

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【作者】 周朝昕王庆韩红艳田熙科杨超

【Author】 ZHOU Zhaoxin,WANG Qing,HAN Hongyan,TIAN Xike,YANG Chao(Faculty of Materials Science and Chemistry,China University of Geosciences,Wuhan,Hubei 430074,China)

【机构】 中国地质大学材料与化学学院

【摘要】 改变占空比、频率、电流密度,探讨脉冲电流对电解金属锰电流效率的影响规律,并与直流电解金属锰进行比较。占空比为0.5、频率为100Hz、电流密度为400A/m2时脉冲电解金属锰的电流效率最高,达到82.1%。在相同电流密度条件下,脉冲电解金属锰的电耗比直流电解金属锰低38.0%。通过XRD、SEM对电解金属锰层进行表征,结果表明:脉冲电解金属锰的沉积层更加平整光滑,颗粒的形貌更加均匀、细致及紧密,成分更纯净。

【Abstract】 The duty ratio,frequency,current density were adjusted to study the influence of pulse current(PC)on manganese electrodeposition.The PC electrodeposition of manganese was compared with direct current(DC)electrodeposition.The current efficiency achieved 82.1% of conditions duty ratio 0.5,frequency 100 Hz and current density 400 A/m2.Under the same current density,the power consumption of PC electrodeposition was 38.0% lower than DC electrodeposition.The deposit was analyzed with X-Ray Diffraction(XRD).The morphology of deposit was characterized by scanning electron microscope(SEM).The results indicated that the manganese deposit of PC electrodeposition was more uniform,closer and more pure.

  • 【文献出处】 中国锰业 ,China’s Manganese Industry , 编辑部邮箱 ,2012年01期
  • 【分类号】TF792
  • 【被引频次】5
  • 【下载频次】170
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