【摘要】 利用直流磁控溅射方法在玻璃基片上沉积了金属钽薄膜,研究了边界效应对薄膜屈曲结构的影响。结果表明:制备态的钽薄膜包含较大的残余压应力,促使薄膜与基片脱层而形成屈曲结构;屈曲结构在薄膜边界处成核生长,并逐渐扩展到薄膜内部区域;在薄膜边界处,屈曲结构呈垂直边界的平行直线状条纹结构,随着距离的增加,屈曲结构逐渐分叉形成无规网格结构或电话线结构。利用薄膜的单轴应力和等双轴应力模型,对屈曲结构边界处的形貌特征进行了深入分析。更多还原

【Abstract】 Tantalum(Ta) films are prepared on glass substrates by direct current magnetron sputtering method,and the edge effect of buckling patterns is investigated.The results show that the as-prepared Ta film contains a large compressive stress,which is relieved by detaching of the film from its substrate.The buckling patterns nucleate at the film edges and then propagate into the central regions of the sample.In the vicinity of the film edge,they generally first have a straight-sided shape perpendicular to the edge,and then transform into bifurcation and buckle network or telephone cord structures.Based on the uniaxial and equi-biaxial stress model,the morphological characteristics of the buckling patterns near the film edges have been analyzed in detail.更多还原