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不同形貌纳米结构的氧化亚铜薄膜的制备及光电性能研究
Preparation and photoelectric property of cuprous oxide thin film with different morphologies
【摘要】 采用铜阳极氧化法生成了各种形貌的氧化亚铜薄膜材料.通过X-射线衍射(XRD)、扫描电子显微镜(SEM)、开路电压(open circuit)等测试方法对样品的结构及光电化学性能进行了表征.结果表明:反应时的面电流密度及表面活性剂对氧化亚铜形貌有比较大的影响.当CTAB为表面活性剂时,随面电流密度增大,氧化亚铜的形貌从网状、片状到棒状转化.当阳极液中表面活性剂为CTAB、PVP、PEG时,可以分别得到纳米带状、枝桠状及纳米线状的氧化亚铜,并且纳米线状的氧化亚铜具有最好的光电性能.
【Abstract】 Nanostructured cuprous oxide thin films with different morphologies were prepared by the method of copper anode oxidation.The obtained cuprous oxide thin films were characterized with the techniques of X-ray diffraction(XRD) and scanning electron microscopy(SEM).Open circuit was employed to record the photoelectrochemical properties of the nanostructures.The results show that both surface current density and surfactant have great impact on the morphology of the nanostructured cuprous oxide.Using CTAB as the surfactant with the increase of current density,the morphology of Cu2O can be nanonet,nanosheet and nanorod arrays respectively.Nanobelt,branch-like and nanowire Cu2O film are detected when the anodic electrolyte contains a certain amount of CTAB,PVP,PEG respectively.The nanowire cuprous oxide thin film has the best photoelectric property.
【Key words】 anode oxidation; cuprous oxide film electrode; photoelectric property;
- 【文献出处】 华中师范大学学报(自然科学版) ,Journal of Huazhong Normal University(Natural Sciences) , 编辑部邮箱 ,2012年06期
- 【分类号】O614.121;TB383.2
- 【被引频次】6
- 【下载频次】606