Enhanced photocatalytic activity of TiO₂ thin film coating on microstructured silicon substrate

【摘要】 Photocatalytic TiO2 thin film is prepared by sol–gel technique on microstructured silicon substrate produced by femtosecond laser cumulative irradiation. The photocatalytic activity is evaluated by the degradation of methylene blue (MB) solution under ultraviolet (UV) irradiation. For 6-ml MB solution with initial concentration of 3.0×10~-5 mol/L, the degradation rate caused by TiO2 thin film of 2-cm~2 area is higher than 70% after 10-h UV irradiation. Microstructured silicon substrate is found to enhance photocatalytic activity of the TiO2 thin film remarkably. The femtosecond laser microstructured silicon substrate is suitable to support TiO2 thin film photocatalysts.更多还原

【Abstract】 Photocatalytic TiO2 thin film is prepared by sol-gel technique on microstructured silicon substrate produced by femtosecond laser cumulative irradiation. The photocatalytic activity is evaluated by the degra-dation of methylene blue (MB) solution under ultraviolet (UV) irradiation. For 6-ml MB solution withinitial concentration of 3.0×10~-5 mol/L, the degradation rate caused by TiO2 thin film of 2-cm~2 area ishigher than 70% after 10-h UV irradiation. Microstructured silicon substrate is found to enhance photocatalytic activity of the TiO2 thin film remarkably. The femtosecond laser microstructured silicon substrateis suitable to support TiO2 thin film photocatalysts.更多还原