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圆片级封装垂直通孔引线寄生电容研究
The Study on the Parasitic capacitance of Wafer-level packaging vertical feedthrough
【摘要】 垂直通孔引线是圆片级封装方法的关键技术之一。针对玻璃衬底垂直通孔引线技术,本文就通孔引线寄生电容开展了研究。首先,利用Ansoft Maxwell 3D对其寄生电容进行了建模和模拟仿真,研究了不同通孔底面直径(d)、玻璃衬底厚度(t)和通孔中心间距(g)的影响。其次,基于微加工工艺,制备了圆片级玻璃衬底的垂直通孔引线样品。最后,对实验加工样品电容进行测试,并与模拟结果进行了比较与分析。
【Abstract】 Vertical feedthrough is one of important techniques for wafer-level packaging technology.Its parasitic capacitance based on the glass substrate is studied in this essay.At first,we simulated the parasitic capacitance by Ansoft Maxwell 3D and analyzed the effect of different diameters of holes,glass thickness and holes gap.Secondly,vertical feedthroughs were fabricated by microfabrication technology.At last,we measured their capacitances and compared with simulation results.
【关键词】 寄生电容;
玻璃衬底;
垂直通孔引线;
圆片级封装;
【Key words】 parasitic capacitance; glass substrate; vertical feedthrough; wafer level packaging;
【Key words】 parasitic capacitance; glass substrate; vertical feedthrough; wafer level packaging;
- 【文献出处】 功能材料与器件学报 ,Journal of Functional Materials and Devices , 编辑部邮箱 ,2012年06期
- 【分类号】TN305.96
- 【下载频次】118