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硅基三元系PMnN-PZT铁电薄膜制备与研究

Fabrication and characterization of ternary compound PMnN-PZT thin films on silicon substrates

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【作者】 张涛张淑仪李敏周胜男孙斌

【Author】 ZHANG Tao1,2,ZHANG Shu-yi2,LI Min1,ZHOU Sheng-nan1,SUN Bin1(1.College of Science,Xi’an University of Science and Technology,Xi’an 710054,China; 2.Institute of Acoustics,Nanjing University,Nanjing 210093,China)

【机构】 西安科技大学理学院南京大学声学研究所

【摘要】 利用磁控溅射方法在单晶Si基底上沉积三元系铁电薄膜6%PMnN-94%PZT(6%Pb(Mn1/3,Nb2/3)O3-94%Pb(Zr0.52,Ti0.48)O3),采用淬火方法对薄膜进行处理,以促进薄膜钙钛矿结构形成。同时,在相同条件下制备非掺杂PZT(52/48)薄膜以对比薄膜掺杂效果。运用X射线衍射(XRD)技术分析薄膜晶向及晶体结构,运用Sawyer Tower电路测试薄膜铁电性能,运用激光测振仪测试薄膜的压电系数。实验结果表明,所沉积薄膜为多晶钙钛矿结构铁电薄膜,薄膜铁电剩余极化Pr=23.7μC/cm2,饱和极化Ps=40μC/cm2,矫顽场电压2Ec=139kV/cm,横向压电系数e11=-13.2C/m2,薄膜的铁电及压电性能优良。

【Abstract】 The ternary compound ferroelectric thin films,6%Pb(Mn1/3,Nb2/3)O3-94%Pb(Zr0.52,Ti0.48)O3,were deposited on the silicon substrates by the magnetron sputtering method,and the quench method was adopted for the post heat treatment for the perovskite phase.Besides,the non-doped PZT(52/48) thin films were also fabricated for comparisons with the same sputtering method.The X-ray diffraction was used to characterize the crystal structures of thin films,and the Sawyer Tower circuit was used to measure the ferroelectricity,and the laser vibration measurement system was used to measure the transverse piezoelectric coefficient of thin films.The results show that the PMnN-PZT thin films own perovskite structures,and the remnant polarization Pr=23.7μC/cm2,the saturation polarization Ps=40μC/cm2 and the coercive electric field 2Ec=139kV/cm,and the transverse piezoelectric coefficient e31=-13.2C/m2,which identifies that the PMnN-PZT thin films own excellent ferroelectricity and piezoelectricity.

【基金】 国家自然科学基金资助项目(10774074);教育部博士点基金资助项目(20106121120001);中国博士后科学基金面上资助项目(20100471624);陕西省自然科学基金青年人才资助项目(2009JQ1005);陕西省教育厅产业化专项基金资助项目(2011JG10);西安市科技局工业攻关计划资助项目(CXY1125(8))
  • 【文献出处】 功能材料 ,Journal of Functional Materials , 编辑部邮箱 ,2012年13期
  • 【分类号】TM22
  • 【被引频次】3
  • 【下载频次】115
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