节点文献
GD-MS法和ICP-MS法测定高纯铌中痕量元素
Determination of trace amounts of elements in high purity niobium by GD-MS and ICP-MS
【摘要】 采用辉光放电质谱法(GD-MS)对高纯铌中Ta,Mo,W等痕量杂质元素进行了测试,并对GD-MS工作参数进行了优化,部分元素与采用电感耦合等离子体质谱法(ICP-MS)定量分析的结果进行比较,对某些元素含量差别较大的原因进行了分析,论述了Element GD辉光放电质谱仪的特点及其在痕量杂质分析上的优势。
【Abstract】 Elements such as Ta,Mo,W in high-purity niobium were determined by glow discharge mass spectrometry(GD-MS).The operating parameters and conditions of GD-MS were optimized and selected.Results of a partion of elements determined by GD-MS were compared with those analyzed by inductive coupled plasma mass spectrometry(ICP-MS).The characteristics and advantages of trace element analysis by element GD-MS were discussed.
【关键词】 高纯铌;
辉光放电质谱法;
电感耦合等离子体质谱法;
痕量元素分析;
【Key words】 High-purity niobium; GD-MS; ICP-MS; Trace element analysis;
【Key words】 High-purity niobium; GD-MS; ICP-MS; Trace element analysis;
【基金】 国家科技支撑计划项目(2006BAF07B02)资助
- 【文献出处】 分析试验室 ,Chinese Journal of Analysis Laboratory , 编辑部邮箱 ,2012年06期
- 【分类号】TG115.33;O657.63
- 【被引频次】8
- 【下载频次】185