【摘要】 SiO₂:F薄膜作为low-e玻璃的功能层材料,广泛应用于节能镀膜玻璃。对帮化学气相沉积法在玻璃表面沉积的约250 nm厚的SiO₂:F薄膜进行不同气氛的退火处理。结果发现,薄膜的电学、光学性能在氦气和空气两种不同的退火气氛下会有显著的变化。SiO₂:F薄膜的Low-e性能经过空气中高温退火下降明显。但在空气中退火后,再在氮气保护下退火,性能会有所恢复。对该现象的机理也进行了研究。更多还原

【Abstract】 The SnO₂:F thin films with low-emission property have been widely used as a dominating kind of energy saving glass.Different annealing approaches were carried out on the as-deposited SnO₂:F（²50 nm,with ²0 nm SiO₂ barrier on glass substrate） thin films.It is found that the electrical and optical characteristics are significantly influenced by annealing atmosphere.The low-emission property of SnO₂:F decreases sharply after post annealing in air,while partly recovers after annealing in air followed by annealing in nitrogen.In addition,the mechanism has also been successfully uncovered.更多还原