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超声注射喷雾热分解法制备CdSe薄膜及其性能的研究

A Study of the Preparation of CdSe Semiconductor films by Ultrasonic Injection Spray Pyrolysis and its Physical Properties

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【作者】 张志乾武光明高德文朱艳英曹阳周洋

【Author】 Zhang Zhiqian Wu Guangming Gao Dewen Zhu Yanying Cao Yang Zhou Yang(Beijing Institute of Petro-chemical Technology,Beijing 102617,China)

【机构】 北京石油化工学院

【摘要】 以CdCl2.2.5H2O为镉源,Na2SeSO3为硒源,柠檬酸钠为络合剂,采用超声注射喷雾热分解法制备了CdSe薄膜。并用XRD、UV-Vis、AFM等方法对其进行了表征。结果表明,所制备的薄膜为n型半导体,在可见光区有较高的吸收,可以获得较好的光电流。应用超声注射喷雾热分解法制备CdSe薄膜的优化条件为:基板温度为300℃,络合剂比例为1∶2,酸度为9,喷雾速度为0.3mL/min,退火温度为350℃。新的制备薄膜装置采用注射超声雾化手段,克服其雾化不均问题。

【Abstract】 Ultrasonic injection spray pyrolysis is involved to synthesize CdSe films,with CdCl2·2.5H2O and Na2SeSO3 as precursors,and trisodium citrate as complexing agent.The films are characterized by XRD,AFM,UV-Vis.The results showed that the CdSe films were n-type semiconductor,having some of the absorption in the visible region.The CdSe film electrode had high photoelectron transfer rate,which leads to a substantial improvement on the photocurrent.The optimal conditions for preparing the CdSe thin films were that the substrate temperature was 300,the proportion of the Cd2+ and trisodium citrate was 1∶2,the PH value was 9,the Spray rate was 0.3ml/min,the annealing temperature was 350 ℃.The preparation of thin-film devices,using a new injection of ultrasonic spray method,can overcome the problem of uneven spray.

  • 【文献出处】 北京石油化工学院学报 ,Journal of Beijing Institute of Petro-Chemical Technology , 编辑部邮箱 ,2012年03期
  • 【分类号】O484.41
  • 【被引频次】2
  • 【下载频次】64
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