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Low threading dislocation density in GaN films grown on patterned sapphire substrates

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【作者】 梁萌王国宏李鸿渐李志聪姚然王兵李盼盼李璟伊晓燕王军喜李晋闽

【Author】 Liang Meng~+,Wang Guohong,Li Hongjian,Li Zhicong Yao Ran,Wang Bing,Li Panpan,Li Jing,Yi Xiaoyan Wang Junxi,and Li Jinmin Semiconductor Lighting R & D Center,Institute of Semiconductors,Chinese Academy of Sciences,Beijing 100083,China

【机构】 Semiconductor Lighting R & D Center,Institute of Semiconductors,Chinese Academy of Sciences

【摘要】 <正>The growth process of three-dimensional growth mode(3D) switching to two-dimensional growth mode (2D) is investigated when GaN films are grown on cone-shaped patterned sapphire substrates by metal-organic chemical vapor deposition.The growth condition of the 3D-2D growth process is optimized to reduce the threading dislocation density(TDD).It is found that the condition of the 3D layer is critical.The 3D layer keeps growing under the conditions of lowⅤ/Ⅲratio,low temperature,and high pressure until its thickness is comparable to the height of the cone-shaped patterns.Then the 3D layer surrounds the cone-shaped patterns and has inclined side facets and a top(0001) plane.In the following 2D-growth process,inclined side facets coalesce quickly and the interaction of TDs with the side facets causes the TDs to bend over.As a result,the TDD of GaN films can decrease to 1×108 cm-2,giving full-width at half maximum values of 211 and 219 arcsec for(002) and(102) omega scans, respectively.

【Abstract】 The growth process of three-dimensional growth mode(3D) switching to two-dimensional growth mode (2D) is investigated when GaN films are grown on cone-shaped patterned sapphire substrates by metal-organic chemical vapor deposition.The growth condition of the 3D-2D growth process is optimized to reduce the threading dislocation density(TDD).It is found that the condition of the 3D layer is critical.The 3D layer keeps growing under the conditions of lowⅤ/Ⅲratio,low temperature,and high pressure until its thickness is comparable to the height of the cone-shaped patterns.Then the 3D layer surrounds the cone-shaped patterns and has inclined side facets and a top(0001) plane.In the following 2D-growth process,inclined side facets coalesce quickly and the interaction of TDs with the side facets causes the TDs to bend over.As a result,the TDD of GaN films can decrease to 1×108 cm-2,giving full-width at half maximum values of 211 and 219 arcsec for(002) and(102) omega scans, respectively.

  • 【文献出处】 Journal of Semiconductors ,半导体学报 , 编辑部邮箱 ,2012年11期
  • 【分类号】TN304.055
  • 【被引频次】5
  • 【下载频次】39
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